355/10nm Laser Optical Filter For Xef
The 355/10nm laser optical filter is a laser filter optimized for XeF (Xenon Fluoride) excimer lasers. Coligh manufactures 254-1550nm laser filters.
- Special design for Xef
- Center wavelength 355nm
- FWHM 10nm
- Blocking depth OD5
355/10nm Laser Optical Filter For Xef Description
Coligh’s 355/10nm Laser Optical Filter For Xef is designed for its typical output wavelength of 355nm, with a central wavelength of 355nm±2nm, a bandwidth of 10nm (FWHM), a peak transmittance of >50%, and a cutoff depth of OD65 for 200-350nm and 360-1200nm, which perfectly matches the 355nm output of the XeF laser and maximizes energy utilization.
We use ion-assisted coating technology, combined with UV-grade fused quartz or other high-quality glass substrates, which can withstand the high-energy pulses of XeF lasers and resist UV aging
355/10nm Laser Optical Filter For Xef Technical Datasheet
Parameter | Specification |
Center Wavelength (CWL) | 355 nm ± 2 nm |
Bandwidth (FWHM) | 10 nm ± 2 nm |
Peak Transmission | ≥ 50% |
Blocking Range | < 0.001% (OD5) from 200 nm to 1200 nm |
Suitable laser | XeF |
Substrate Material | Fused silica / Optical glass |
Surface Quality | 80-50, 60-40, 40-20 scratch-dig (per MIL-PRF-13830B) |
Clear Aperture | > 90% of the diameter |
Filter Diameter | Customizable (e.g.2.0mm, 12.5 mm, 25 mm, 50 mm) |
Coating Type | Hard-coated, ion-Assisted coating |
Angle of Incidence (AOI) | 0° (normal incidence) |
Durability | MIL-STD-810E, Method 507.3 compliant |
Tempreture | -40℃- +60℃ |
355/10nm Laser Optical Filter For Xef Applications
355/10nm Laser Optical Filter For Xef has important applications in many aspects:
- Industrial processing
The 355nm ultraviolet light of XeF laser is suitable for ultraviolet laser microprocessing such as glass/sapphire cutting, PCB drilling and semiconductor wafer etching. This filter can filter out stray light (such as infrared residue) to avoid thermal effects causing micro cracks or carbonization of materials. - Medical cosmetology
In the treatment of pigmentary diseases, 355nm ultraviolet light is used to selectively destroy melanin. This filter can filter out non-therapeutic wavelengths and focus energy precisely on target tissues to avoid possible damage to the epidermis or dermis, causing erythema or pigmentation. - Water quality analysis
In water quality or masonry analysis, when the ultraviolet absorption method is used to detect nitrates in water or atmospheric ozone, this filter can isolate the 355nm signal at the light source end or the detection end, and detect sensitivity